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Post-etch Residue Removers
DeerClean-LK
DeerClean-LK series
The post-etch residue removers that enable to remove residues after dry etching and ashing at low temperature, without causing chemical damages to Cu and a variety of low-k films.
Product Line
Product name
删除对象
Processing method
DeerClean-LK1
Cu系残渣
Batch and single wafer
DeerClean-LK2 series
Cu系残渣、Si系残渣、
DeerClean-LK3 series
Cu系残渣、Si系残渣、
有机残渣
DeerClean-LK4
Cu系残渣
有机残渣
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