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State Key Laboratory of Micromachining Optical Technology (Institute of Optoelectronics Technology, Chinese Academy of Sciences)

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Subordinates of the Chinese Academy of Sciences
Optical technology for micro machining key state laboratories Supported by Institute of Optoelectronics Technology, Chinese Academy of Sciences The laboratory was established in 1991 with the approval of the State Planning Commission. In December 1993, it was approved by the National Planning Commission and national academies of sciences to open to the outside world, and passed the national acceptance in 1996.
Chinese name
State Key Laboratory of Optical Technology for Micromachining
Establishment time
1991
organizational management
Institute of Optoelectronic Technology, China Academy of Family Sciences
Administrative subordination
Chinese Academy of Sciences

Brief overview

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Optical technology for micro machining key state laboratories Supported by Institute of Optoelectronic Technology, China Academy of Family Sciences The laboratory was established in 1991 with the approval of the State Planning Commission. In December 1993, it was approved by the National Planning Commission and national academies of sciences to open to the outside world, and passed the national acceptance in 1996. The director of the laboratory is researcher Luo Xiangang, and the director of this academic committee is academician Zhou Bingkun.

research field

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The laboratory aims to promote the substantive progress of key scientific and technical issues in micro processing optical technology, aims to serve the major strategic needs of the country with basic research, aims at the international forefront of micro nano optics, focuses on the interaction between electromagnetic waves and micro nano structures, and conducts in-depth research on new phenomena and mechanisms of electromagnetic waves in micro nano structures and the generation methods of micro structures, To form a base for basic and applied basic innovation research, talent training and popular science education in new concept materials, micro/nano optoelectronic devices and systems.
The laboratory mainly carries out research in four directions: micro/nano optics and sub wavelength optics, micro optics and micro systems, micro/nano processing technology and equipment, high-resolution imaging and spectroscopy technology. The research contents include: subwavelength artificial structural materials, super diffractive optics, optometry wavefront engineering, micro nano optics, micro machining technology and equipment, MEMS technology, 193nm lithography, lightweight high-resolution imaging, etc.

Exchange and cooperation

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State Key Laboratory of Optical Technology for Micromachining It has a good cooperative relationship with more than dozens of domestic and foreign scientific research institutes, colleges and universities in this field. University of Manchester, University of Berkeley, National University of Singapore, Rutherford, UK key state laboratories Switzerland Zurich CSEM laboratory, American SUPERRRAY company, Sichuan University, Microelectronics Center of Chinese Academy of Sciences, Shanghai Institute of Technology and Physics, etc Micro optics , microelectronics optics and its applications have carried out fruitful cooperation and exchanges.

Project achievements

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Our scientific research funds are increasing year by year, and we have achieved a number of high-level research achievements: Micro optics The technology research platform, based on the moving mask exposure method proposed by the laboratory, solved the high fidelity transmission of various micro relief structures in the photolithography process by optimizing the design and developing new processes, and produced large numerical aperture Wide band from infrared to ultraviolet, deep relief, aspherical, high Fill factor The micro array elements based on FPGA can realize the integration of small systems. Developed successfully for Hartmann wavefront sensor, infrared focal plane The light concentrator in the detector and semiconductor laser The wavefront shaping array elements of the 863 have made contributions to the national high-tech development.
diffraction Microlens The practical research of array has reached the domestic leading and international advanced level. Facing the needs of the development of aerospace industry, the research results of hybrid refractive diffractive optical system were applied to aerospace optical systems for the first time in China. The refractive diffractive hybrid imaging optical system has field Large, light weight, no distortion and strong temperature adaptability; For space imaging refractive diffractive hybrid optical system Transmissivity It is 2.2 times of the traditional optical system, and the operating distance is doubled. The star sensor developed in the laboratory can improve the satellite attitude and orbit control accuracy by nearly one Order of magnitude These research results have broad application prospects in military, aerospace and civil fields.
The key unit technology of microelectronic lithography has been studied unremittingly. Breakthrough numerical aperture Photolithography objective lense The design and development of G line and I line large numerical aperture projection lithography objective lens, uniform lighting system, high-precision coaxial alignment and worktable positioning and other difficult unit technologies have made China one of the few countries in the world that can develop and produce G line and I line large numerical aperture projection lithography objective lens. This achievement has won the first prize for scientific and technological progress of the Chinese Academy of Sciences, and successfully developed the first 0.8 μ m projection lens in China Photolithography machine , won the third prize of National Science and Technology Progress Award National Microelectronics The development of equipment provides a technical basis. The laboratory also carried out in-depth and systematic research on wavefront engineering, using excimer lithography system and phase-shifting mask technology to improve the resolution from 0.5 μ m to 0.3 μ m; The atomic force Photolithography Prospective research has made good progress.
Since 1997, it has won one third prize of the National Science and Technology Progress Award, one first prize and one third prize of the Chinese Academy of Sciences Science and Technology Progress Award, one third prize of the Chinese Academy of Sciences Natural Science Award, and one third prize of Sichuan Science and Technology Progress Award. 20 invention patents were accepted and 24 utility model patents were authorized. He has published more than 260 academic papers in core scientific journals and conferences at home and abroad.
After a new round of national assessment in 2012, the laboratory has successively formulated a series of strategic plans in terms of talent introduction, high-level scientific research achievements and management mechanism Micro optics , refractive diffractive hybrid optics and microelectronic optical technology, facing the international high-tech frontier in the information field, strive to build the laboratory into an international first-class research base for micro optics and microelectronic optical technology innovation and a base for cultivating high-level R&D talents.