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Chemical etching

Technology of removing materials by chemical reaction or physical impact
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Chemical etching, that is, etching is a technology to remove materials by chemical reaction or physical impact.
Chinese name
Chemical etching
Foreign name
Chemical etching
Principle
Chemical reaction or physical impact
Purpose
Chemical processing of glass surface

Basic Introduction

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Chemical etching
Etching is a technique of removing materials by chemical reaction or physical impact.
Etching technology can be divided into "wet etching" and "dry etching".
Generally speaking, the etching is also called photochemical etching, which refers to removing the protective film of the area to be etched after plate making and development by exposure, contacting the chemical solution during etching, so as to dissolve the corrosion and form concave convex or hollow molding effect.
It was first used to manufacture concave and convex printing plates such as copper plate and zinc plate, and is also widely used to process weight reduction instrument panels, famous brands and thin workpieces that are difficult to process by traditional processing methods; Through continuous improvement and development of process equipment, it can also be used for the processing of precision etching products of electronic sheet parts in the aviation, mechanical and chemical industries. Especially in the semiconductor manufacturing process, etching is an indispensable technology.
For example, the characters and symbols of Moto V3 keyboard are formed by hollow etching process.

process

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Process: cleaning plate( stainless steel other Metallic materials )---Drying --- coating --- exposure --- development --- etching --- film removal
Chemical processing of glass surface
Use hydrofluoric acid to corrode the local surface of glass products, and paint various patterns, patterns, scales, lattices, etc. on the surface. The chemical etching process is to first apply protective paint or paraffin on the glass surface to be etched, and then put in an etching solution consisting of hydrofluoric acid and a small amount of NH4F. The glass surface layer acts with hydrofluoric acid, and the generated fluoride is dissolved in the etching solution or deposited on the glass surface.