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Uneven

Loss caused by inhomogeneous refractive index of optical fiber material
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Optical fiber Loss caused by non-uniform refractive index of materials.
In the process, for Etching Process, uniformity is a parameter that measures the etching ability of the etching process on the whole wafer, or the whole batch, or between batches. For the coating process, uniformity is a parameter used to measure whether the coating thickness is consistent. NU%=(Emax—Emin)/Eave
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Uneven
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Optical fiber Loss caused by inhomogeneous refractive index of materials
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