特殊检验
- 详细信息
Performance Chemicals are etchants，resist strippers and cleaning solutions for semiconductors and FPD（Flat Panel Display）to manufacture。Kanto Chemical always makes an effort to the development by using our know-how。
清洁解决方案
For Si Wafer
| Frontier Cleaner Series |
Frontier Cleaner series are chemicals to improve and simplify the conventional RCA cleaning process。The chemical of this series greatly contributes to cost reduction because these chemicals are used after dilution。 |
| TMK-1 |
|
For Post CMP
| CMP-M Series |
CMP-M and CMP-B series are Post CMP Cleaning Solution for Cu/low-k。
They are capable of removing metal impurities，particles and organic substances after CMP cleaning without chemical attack on Cu and low-k。
|
| CMP-B Series |
For Ru
For OLED Material
| OEL Clean Series |
OEL Clean series enables you to easily remove organic EL material on the mask applied to low molecular organic EL deposition process。
This series also bring out high performance when cleaning inner parts of deposition equipment。
|
后沿阻力，后沿阻力
For Cu/low-k Process
| DeerClean-LK Series |
DeerClean-LK series are polymer remover high ly recommendable for the single wafer cleaning method。They are capable of removing sidewall polymers within short time under low temperature after ashing without chemical attack on Cuand Low-k film。 |
For AI Process
| DeerClean-SA Series |
DeerClean-SA series are polymer remover that is highly recommendable for the single wafer cleaning method。They are very effective in removing polymers under low temperature within short time。
单通道处理 |
| JELK Series |
JELK series are polymer remover high ly recommendable for batch cleaning method。They are hydroxylamine free and capable of removing performance of organic substances&metal residues。
For Batch process |
| SWPR Series |
For Batch process |
Resist Strippers
For Positive Photoresist
| KP-301 |
For Culine |
| KP-401AG |
钢轨 |
Developers
For Positive Photoresist
Silicone Resin Solubilizer
KSR series are able to remove silicone resin easily。It has no chemical attack on various substrate such as metals，glasses，ceramics，glass epoxies，and etc。
| KSR-1 |
For general use |
| KSR-2 |
刚度，刚度 |
High Purity Potassium Hydroxide aq。解决方案，解决方案
KANTO improved the qualities of the raw material，parts for manufacturing process and purification process to decrease metal impurities and particles in potassium hydroxide solution。
Aqueous Sodium Hydroxide Inhibits Metal Adsorption
NaOH-CX is special blend of Aqueous Sodium Hydroxide with chelating agents which is capable of inhibiting Fe，Ni and Cu impurities adsorption on the Si wafer during cleaning and etching process。
出口，出口
固定文件
| KSMF Series |
KSMF series are capable of etching stacked metal film，which is made up of Al，Mo，Ti，etc.，at the same time in the process of forming electrode of FPD。 |
For Cu
| Cu Series |
Cu series are etchant for Cu film effective in fine patterning in the process of forming Cu wiring of FPD。 |
For Ag
| SEA Series |
SEA series are etchant for Ag film effective in fine patterning in the process of forming Ag wiring and reflecting electrode of LCD and OLED。 |
For Au
| AURUM Series |
AURUM series are etchant for Au and Pd that have high wetness performance to create excellent pattern in the process of forming bump and wiring。 |
传输控制文件
| ITO Series |
ITO series are etchant for ITO and IZO film effective in fine patterning in the process of forming picture electrode。 |
For Cr
Please feel free to contact us for information on“Other”etchants。
| For Al，Mo，Ta，Ti，W，Si，SiO2，GaAs，etc。 |
