The semiconductor capacity continues to expand, and the demand for supporting equipment accelerates
With the rapid development of electronic information industry, the market size of China's semiconductor industry has also grown from 131.5 billion dollars in 2017 to 182 billion dollars in 2022. Based on the accelerated localization process of the semiconductor industry and the continuous expansion of downstream wafer factories, Chinese chip manufacturers are expected to open 18 new wafer factories in 2024, and the capacity will increase from 7.6 million to 8.6 million pieces. In the trend of semiconductor localization, the expansion of domestic wafer factories is also expected to drive the domestic substitution demand for semiconductor supporting equipment, which will continue to increase with the expansion of wafer factories.
Particle pollution affects product quality, and semiconductor manufacturing requires high cleanliness
According to the world wafer fab forecast recently released by the International Semiconductor Equipment Manufacturers Association (SEMI), more than 50% of the semiconductor output loss can be attributed to micro pollution. In order to minimize yield loss, semiconductor manufacturers must adopt strict pollution control strategies in clean rooms. The semiconductor manufacturing process is complex. How to improve the yield of products is crucial for semiconductor enterprises to maintain their advantages in the competition. There are many factors that affect the yield of semiconductors, among which the air impurities (dust particles) in the production process can not be ignored. Because the graphic feature size and the thickness of the surface deposition layer of high-density integrated circuits have been reduced to the micron level, they are more vulnerable to the impact of particles. Such particles attached to the semiconductor surface may form fatal defects, leading to device failure.
Cleaning conditions of LSI manufacturing processes and clean rooms
The square photoelectric dust particle counter makes the dust in the clean room disappear
Sifang photoelectric online particle counter OPC-6510DS adopts the optical scattering principle, which can accurately detect and calculate the number of suspended particles with different particle sizes in the air per unit volume. It has a gas sampling rate of 28.3L/min with a large flow rate, and can simultaneously output the number of particles in five channels of 0.3um, 0.5 μ m, 1.0 μ m, 5.0um, and 10um (the default unit is pcs/28.3L). It is widely used in hundreds, thousands Class 10000, 100000 and other clean room environments.
L 3.5 inch touch screen is used to display the quantity, grade and alarm information of each particle size in real time
L Built in Sifang photoelectric dust source intelligent identification module, with high particle recognition rate and high detection accuracy
L Built in ultrasonic flow sensor, realizing 28.3L constant current sampling, high long-term stability of data
Low noise turbine fan sampling, good continuous monitoring stability, long service life
L Meet IS014644-1:2015, new GMP, JF1190-2008, GB/T6167-2007 standards
|Meet IS014644-1:2015, new GMP, JF1190-2008, GB/T6167-2007 standards
In the future, Sifang Optoelectronics will continue to focus on light scattering technology, continue to innovate, provide customers with customized clean room solutions, and help customers improve product quality.
